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UV-NIL Imprinting of Sub-50nm Resolution

UV-NIL is a low-cost production technology that is based on UV-curing. It has been developed as a cost-effective alternative to high-resolution e-beam lithography to print nanometer sized geometries. UV-NIL solutions may be the enabling technique for next generation semiconductor, MOEMS, NEMS and optoelectronic technology. The new MA/BA8 single sided imprint UV-NIL toolkit can be field upgraded with very limited effort, offering a straightforward upgrade path for SUSS MicroTec customers to enter the nano world.

Click images to enlarge

160nm wide holes positioned in concentric rings as used for photonic crystals. Printed in amonil MMS4 on a SUSS MA6 mask aligner
Lines and spaces 1:2 50nm, 70nm, 100nm

160nm wide holes
Replication of a sinlge imprint field with SUSS MicroTec Logo

UV-NIL Imprinting of Sub-50nm Resolution

See also

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