SUSS Technology Forum Nanoimprint

Join the platform where different approaches and angles of nanoimprint lithography will be presented and discussed.

MA200 Gen3: New Mask Aligner

The new tool generation incorporates an improved throughput as well as a better process administration and -definition.

DSC300 Gen2: New Projection Scanner

The new DSC300 Gen2 combines the advantages of full-field exposure and conventional projection lithography. Equipped... read more

ELP300 Gen2: New Excimer Laser Stepper

The newest generation ELP300 meets the technology driven requirements of the Advanced Packaging and 3D industry... read... read more

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SUSS MicroTec拥有60多年的历史,是半导体行业领先的微结构工艺设备提供商。产品涵盖后道光刻、晶圆键合、光掩模清洗和微光学器件等诸多解决方案。