MO Exposure Optics®

MO Exposure Optics® is a novel optics design for SUSS mask aligners introduced in 2010. The MO Exposure Optics uses micro-lens plates instead of macroscopic lens assemblies. It also takes advantage of exchangeable Illumination Filter Plate (IFP). MO Exposure Optics fits in all existing SUSS Mask Aligner illumination systems. Changing to MO Exposure Optics is a simple Plug & Play operation.

MO Exposure Optics® is delivered with a full library of basic illumination settings, including settings which are analogue to the classical HR and LGO. The optics supports the customer by widening his process window through improved illumination uniformity and the possibility to easily switch between optics configurations for different exposure gaps. Besides the improvements in illumination uniformity and flexibility of the configuration the MO Exposure Optics® also enables the user to apply modern resolution enhancement techniques like optical proximity correction (OPC) and source mask optimization (SMO). However, these techniques require profound understanding of the exposure process and open an additional field of process parameters which increases the complexity of the process development.

Eigenschaften & Highlights

• Verbesserte Gleichförmigkeit der Belichtung (± 2%) erweitert die Prozessmöglichkeiten und erhöht die Ausbeute
• Größere Lichtmenge (bis zu 25%) führt zu höherer Auflösung und steileren Seitenwänden
• Höchste Prozessflexibilität durch individuelle Gestaltungsmöglichkeiten bei der Belichtung
• Optimierte Beleuchtung für spezielle Maskenstrukturen
• Variable Beugungsreduzierung