Clean, Bake and Develop
The MaskTrack Pro family solves Next Generation Lithography roadmap requirements for Clean, Bake and Develop. Based on the industry-recognized success of the MaskTrack, MaskTrack Pro was designed to balance the most stringent conditions of 193i 22nm hp DPT, Extreme Ultraviolet Lithography (EUVL) and Nano-Imprint Lithography (NIL) processing with innovative techniques to maximize mask performance.
With mask integrity playing a greater part in the success of advanced lithographic processing, MaskTrack Pro is the only platform that is specifically designed as an extension to the lithography process. It is extendable to allow tool clustering with third-party products for a holistic approach to storage, handling and processing of the mask in a fully-controlled and ultra-clean environment. MaskTrack Pro has been accepted as the platform of choice by the most advanced mask manufacturing and lithography customers in the industry.more