Thursday, February 28th, 2013
3D Lithography Simulation Workshop
We would like to invite you to join us for the 3D Lithography Simulation Workshop, organized by GenISys in co-operation with SUSS MicroTec and Fraunhofer IISB Erlangen. The workshop will focus on 3D optical proximity lithography simulation using mask aligner. We will present techniques like OPC, SMO (Source Mask Optimization) using the new MO Exposure Technique for SUSS mask aligner and simulation of topographical stacks. Andreas Erdmann from Fraunhofer IISB will discuss 3D resist simulation and resist parameter calibration.
We look forward to welcoming you!
Details
| Date: | Thursday, February 28th, 2013 |
| Time: | 14:00 -18:00 |
| Location: | HILTON HOTEL SAN JOSE, 300 Almaden Boulevard, San Jose Room: Market 1 (first floor reception level) |
The workshop is free of charge!
Agenda
| Agenda | ||
|---|---|---|
| 14:00 | Optical Lithography Simulation Introduction & Overview: History, Application, Challenges, Opportunities Nezih Unal (GenISys) | |
| 14:30 | Mask Aligner Lithography Simulation: From Layout to 3D resist pattern Ulrich Hofmann (GenISys) | |
| 15:00 | Advanced Mask Aligner Lithography: AMALITH, Pushing the Limits: Source Mask Optimization Reinhard Völkel (SUSS MicroOptics SA) | |
| 15:30 | LAB Simulation: Interactive Live Demo: Mask Aligner Lithography Cases Gerald Lopez (GenISys) | |
| 16:00 | Coffee Break | |
| 16:15 | Layout LAB – An Industry Example Ralph Zoberbier (SUSS MicroTec) | |
| 16:45 | Modeling and Calibration of Photoresists for Mask Aligner Lithography Simulation Andreas Erdmann (Fraunhofer IISB) | |
| 17:05 | Noval Pattern Technologies for WLP and MEMS applications Ralph Zoberbier (SUSS MicroTec) | |
| 17:25 | LAB Simulation: Interactive Live Demo - Proximity, Projection and e-Beam Lithography Gerald Lopez (GenISys) | |
| 17:40 | Summary and Discussion | |
| 18:00 | Closing | |
The agenda is subject to change.
More information
Registration | Download theInvitation | ||
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