Join us for the LAB - 3D Lithography Simulation Workshop, organized by GenISys in co-operation with SUSS MicroTec.

Date:Thursday, 27th February 2014
Location:HILTON HOTEL SAN JOSE, 300 Almaden Boulevard, San Jose
Room: Market 1 (reception level)
Begin:9:00 a.m.
End:12:00 a.m.

LAB – 3D Simulation Workshop

LAB – 3D Simulation Workshop will focus on 3D optical proximity lithography simulation using mask aligners. The workshop is organized in co-operation with SUSS MicroTec and Microresist Technologies. We will present techniques like OPC, SMO (Source Mask Optimization) using the new MO Exposure Technique for SUSS mask aligner and simulation of topographical stacks. Andreas Erdmann from Fraunhofer IISB will discuss 3D resist simulation and resist parameter calibration.

The meeting is free of charge. Lunch and coffee/drinks are included. For registration just fill our the registration form or send a short e-mail to Adriane Doms so we can reserve your seat.

We are looking forward to presenting you with an interesting and valuable workshop.


9:00 Welcome & Introduction
Nezih Unal (GenISys)
9:10 Mask Aligner Lithography Simulation: From Layout to 3D resist pattern
Andreas Erdman (Fraunhofer IISB)
9:40 Advanced Mask Aligner Lithography - AMALITH
Pushing the Limits: Source Mask Optimization

Reinhard Völkel (SUSS MicroOptics)
10:10 LAB Simulation: Mask Aligner Lithography Cases
Ulrich Hofmann (GenISys)
10:30 Coffee Break
10:40 Resists and Photopolymers for Mask Aligner and e-Beam Litho Simulation
Anja Voigt (micro resist technology)
11:00 Application Example for Mask Aligner Simulation and MO Exposure Optics
Reinhard Völkel (SUSS MicroOptics)
11:20 LAB Simulation: Interactive Live Demo - Proximity, Projection and e-Beam Lithography
Gerald Lopez (GenISys)
11:40 Summary and Discussion
12:00 Closing (Lunch)

The agenda is subject to change.