Visit us at the SPIE Advanced Lithography 2014 exhibition and conference and discuss developments and future directions on lithography technology. Meet our experts and address questions about materials, equipment and processing of your application.


Date:Feb 23-27, 2014
Location: San Jose, California, United States
Address:San Jose Marriott and San Jose Convention Center



Topic:Lithographic process window optimization for mask aligner proximity lithography
Abstract:Process window optimization is introduced for mask aligner proximity lithography. In the past, source variation and the lack of simulation tools did not allow to use process windows for optimizing proximity lithography. Recently, telecentric illumination, source shaping ability and full 3D simulation became available for mask aligners equipped with MO Exposure Optics. Now accurate simulation and predictive process modeling allow optimizing critical lithography steps without experiments. We present results from simulation and experiment. With more than 5'000 mask aligners installed in research and industry, the proposed method will have significant impact on yield improvement and cost saving.
Authors:Reinhard Voelkel, Uwe Vogler, Arianna Bramati, Andreas Erdmann, Nezih Ünal, Ulrich Hofmann, Marc Hennemeyer, Ralph Zoberbier, David Nguyen, Juergen Brugger
Date:25 February 2014
Time:5:00 - 5:20 PM | Part of SPIE Advanced Lithography



Topic:Micro-optics: Enabling Technology for Illumination Shaping in Optical Lithography 
Abstract:Optical lithography is the engine that empowered semiconductor industry to continually reduce the half-pitch. When projection optics reached highest level of perfection, further improvement was achieved by optimizing illumination. Shaping the illumination light, also referred as pupil shaping, allows to optimize the optical path from reticle to wafer and has major impact on aberrations and diffraction effects. Highly-efficient micro-optical components are perfectly suited for this task. Micro-optics for illumination evolved from simple flat-top (fly’s-eye) to annular, dipole, quadrupole, multipole and freeform illumination. Today, programmable micro-mirror arrays allow to change illumination on the fly. The impact of refractive, diffractive and reflective micro-optics for lithography from UV to EUV will be discussed.
Presenter:Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)
Date:25 February 2014
Time:6:00 - 8:00 PM | Part of SPIE Advanced Lithography

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