UV-NIL Imprinting of Sub-50nm Resolution

UV-NIL is a low-cost production technology that is based on UV-curing. It has been developed as a cost-effective alternative to high-resolution e-beam lithography to print nanometer sized geometries. UV-NIL solutions may be the enabling technique for next generation semiconductor, MOEMS, NEMS and optoelectronic technology. The new MA/BA8 single sided imprint UV-NIL toolkit can be field upgraded with very limited effort, offering a straightforward upgrade path for SUSS MicroTec customers to enter the nano world.


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160nm wide holes positioned in concentric rings as used for photonic crystals. Printed in amonil MMS4 on a SUSS MA6 mask aligner

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Lines and spaces 1:2 50nm, 70nm, 100nm

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160nm wide holes

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Replication of a sinlge imprint field with SUSS MicroTec Logo

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