SUSS MicroTec and GenISys Announce Cooperation on Mask Aligner Lithography Simulation Software

“The sophisticated and latest SUSS exposure optics technology, MO Exposure Optics®, enables the use of frontend technologies like illumination shaping and mask layout optimization on mask aligner equipment”

— Frank Averdung, President and CEO of SÜSS MicroTec AG

Garching, GERMANY, February 21, 2012 – SUSS MicroTec a leading supplier of equipment and process solutions for the semiconductor industry and related markets and GenISys GmbH, provider of high-performance software solutions for nano scale fabrication, today announced a cooperation agreement to combine the SUSS MicroTec mask aligner tools with the GenISys simulation software Layout LAB™.

Within the cooperation GenISys Layout LAB™ has been enhanced to accurately model all available SUSS MicroTec mask aligner exposure optics. Both parties join forces to market the SUSS MicroTec mask aligner technology with the GenISys lithography simulation software Layout LAB™. The combination of lithography equipment and matching simulation software is a key success factor for cost effective process and device development for the end user.

"The sophisticated and latest SUSS exposure optics technology, MO Exposure Optics®, enables the use of frontend technologies like illumination shaping and mask layout optimization on mask aligner equipment", said Frank P. Averdung President and CEO of SÜSS MicroTec AG. "This in combination with GenISys simulation software is a key technology enabler as it allows easy modeling of large numbers of different source shapes."

"Layout LAB™ is a professional full 3D simulation platform for optical proximity lithography, which enables to optimize mask layout and exposure conditions by running a large number of simulations overnight. Besides saving direct costs, users are gaining time to market" said Nezih Unal, Vice President of GenISys.