MA/BA8 Gen3

Because of their ability to easily process virtually all kinds of wafer and substrate materials, manual aligners are increasingly used in production environments. With the new MA/BA8 Gen3 SUSS MicroTec addresses the growing demand for tighter process control coupled with high yield. The MA/BA8 Gen3 is a highly versatile system for R&D and operator-assisted production. In addition it allows easy and fast upgrades to complementary technologies.

Product Features & Highlights

  • High resolution (HR) optics allow patterning of structures below 0.5µm
  • Operator assisted and auto alignment permits <0.25 µm alignment accuracy
  • Advanced semi-automatic functions for maximum process control
  • Processes compatibility with automated equipment
  • Optimized splitfield microscope with eyepieces. Direct viewing and/or LCD flat screen options possible
  • Offers a large variety of options