MA/BA8 Gen3

Because of their ability to easily process virtually all kinds of wafer and substrate materials, manual aligners are increasingly used in production environments. With the new MA/BA8 Gen3 SUSS MicroTec addresses the growing demand for tighter process control coupled with high yield. The MA/BA8 Gen3 is a highly versatile system for R&D and operator-assisted production. In addition it allows easy and fast upgrades to complementary technologies.

Alignment

All alignment technologies of the MA/BA8 Gen3 stand for high alignment accuracy:

Exposure

Exposure Optics

  • HR and LGO optics
  • Diffraction reducing optics

Automation

  • Assisted alignment
  • Auto alignment
  • Image processing
  • Wedge error compensation (WEC)