Manual Mask Aligner
MA/BA8 Gen3
The Dedicated Solution for Industrial Research and Operator Assisted Alignment
The MA/BA8 Gen3 is the new benchmark in full-field lithography for MEMS, Advanced Packaging, 3D Integration and Compound Semiconductor markets. In addition, it supports emerging processes like micro- and nano-imprinting, bond alignment and UV-bonding as well as selective Plasma activation with its unmatched variety of options and maximum flexibility.
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