Angular Exposure

Angular Exposure Option for Exposure of Steep to Perpendicular Sidewalls

For exposure of steep to perpendicular sidewalls as used in/on micromechanical structures, vertical trenches or for interconnect lines between two or more stacked dies SUSS MicroTec offers the Angular Exposure System. In addition to steep sidewalls angular exposure addresses processes with different layer thicknesses on high topography structures, which need to be exposed with different light doses in order to achieve a uniform exposure result.  Besides 90 degree angular illumination enables exposure of 60 and 45 degree angles.

So far SUSS MicroTec's angular exposure option is available for the MA200 Compact Mask Aligner only.