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Advanced Single Substrate Cleaner ASC 5500

ASC 5500 ensures 100% soft defect removal, careful PSM cleaning and minimal residual ions
during critical cleaning stages.

ASC 5500 can be equipped for fully automated processing of multiple types of substrate

• Binary and phase shift masks
• Photomasks and other square substrates up to 9”
• Round Substrates (wafers or imprint masks) up to 300mm
  
  

ASC 5500 meets and exceeds safety and ergonomic standards, SEMI S2-0302 and SEMI S8-0701,
and is CE marked.

Product Features & Highlights

• Highest first pass cleaning yield, resulting in extended mask life.
• Minimal phase and transmission change.
• Low residual ion concentrations avoiding haze.
• Enables both dry and wet cleaning processes, reducing chemicals usage: Dual Megasonic cleaning,
  In-situ SC1, In-Situ SPM, 172nm UV dry cleaning, Ultra-Clean hot DI rinse
• ESD-safe cleaning
• Monitoring PoU media parameters
• Low cost of ownership with small footprint (1200 x 1200mm)
• High reliability and uptime, proven by large installed base of > 200 systems (ASx series)
• Fully automated, including SMIF load / unload
• Equipment clustering option, e.g. with Pellicle mount station or inspection station