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- 193i 22nm hp DTP
- EUVL
- NIL
Product Features & Highlights
- Improves time-to-market
- Increases mask lifetime
- Maximizes scanner uptime
- Reduces expensive wait time at metrology
MaskTrack Pro Family
Clean 193i 22nm / EUVL
193i 22nm / EUVL Mask Cleaning System
MaskTrack Pro offers a unique combination of physical and chemical cleaning technologies that enables customers to effectively remove organic and inorganic contamination without damage to the vulnerable features and material structures of the reticle. The innovative design allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach critical for EUVL processing.
Product Features & Highlights
- Up to three pre-clean and final-clean chambers
- Unique in-situ UV surface preparation and cleaning
- High frequency dual Megasonic cleaning up to 4MHz
- Precision Nano Binary spray
- High temperature dehydration (193i)
- Soft RTP purification, dehydration and surface restoration (EUVL)
- Ultra-clean Hot and Cold DI water
- Electrolyzed H2 and Ozonated DI water, Ultra-Dilute SC1
- Web Cam wet process online monitoring
- Wet substrate transfer between pre and final clean chamber
- Dry flip functionality
- Low contact linear substrate transfer handling
- Multiple input/output and substrate buffer stations
- 172nm UV surface preparation
- Degassing DIW-H20 input functionality
- 30nm process media filtration
Clean HVM 193i 22nm / EUVL
HVM 193i 22nm / EUVL Mask Cleaning System
MaskTrack Pro offers a unique combination of physical and chemical cleaning technologies that enables customers to effectively remove organic and inorganic contamination without damage to the vulnerable features and material structures of the reticle. The innovative design allows clustering of metrology systems and pod-in-pod stocking for a holistic mask management approach critical for EUVL processing.
Product Features & Highlights
- Segregated of strip, pre-clean and final clean processes
- Unique in-situ UV surface preparation and cleaning
- High frequency dual Megasonic cleaning up to 4MHz
- Precision Nano Binary spray
- Soft RTP purification and dehydration
- Ultra-clean Hot and Cold DI water
- Electrolyzed H2 and Ozonated DI water, Ultra-Dilute SC1
- Wet substrate transfer between pre and final clean chamber
- Dry flip functionality
- Low contact linear substrate transfer handling
- Multiple input/output and controlled environment substrate buffer stations
- 172nm UV surface preparation / backside cleaning
- Degassing DI-H20 input functionality (avoiding feature damage)
- 30nm prcess media filtration
- Interface to Pod-in-Pod automation module
InSync EUVL Mask Management
InSync EUVL Mask Management
The MaskTrack Pro EUVL Mask Management Module offers the industry’s only solution for a holistic mask management environment. The innovative design allows pod-in-pod stocking, inner pod-in-pod decontamination, full integration of metrology and third-party systems clustering.
Product Features & Highlights
- Direct and closed-loop interface to MaskTrack Pro cleaning system
- Capable of full metrology integration
- Allows clustering of third-party systems
- Functional as a stand-alone unit
- Pod-in-Pod loadport (compatible with NXE3100 scanner)
- EUV Inner-Pod handling, opening and stocking system
- Interface to MaskTrack Pro cleaning system
- Local XCDA controlled environment
- Accepts standard SMIF boxes for transfer to/from SMIF to pod-in-pod
Clean NIL
TeraPure Imprint Template Cleaning System
TeraPure is the template cleaning system of choice for revolutionary Nano-Imprint Lithography (NIL) processing. At the heart of the TeraPure is proven cleaning technology and HamaTech’s industry-recognized highest first-pass cleaning yield. A modular design offers customers the flexibility needed for a dynamic and developing technology, such as NIL.
Product Features & Highlights
- Two separate cleaning chambers
- Unique in-situ UV surface preparation and cleaning
- High frequency dual Megasonic cleaning up to 4MHz
- Precision Nano Binary spray
- High temperature dehydration
- Ultra-clean Hot and Cold DI water
- Electrolyzed H2 and Ozonated DI water, Ultra-Dilute SC1,CO2-DI
- Web Cam wet process online monitoring
- Flexible automation for 65nm master templates and 6” replicas
- Low contact linear substrate transfer handling
- Individual input/output and substrate buffer stations
- Degassing DI-H20 input functionality
- 30nm process media filtration
Bake & Develop
Bake and Develop System
The MaskTrack Pro Bake/Develop system is part of SUSS MicroTec's holistic mask integrity product family for Next Generation Lithography. Designed for challenges of sub-32nm lithography the MaskTrack Pro Bake/Develop protects even the most complex masks in the fab.
Product Features & Highlights
- One process chamber station with revolutionary acoustic streaming ASonic develop technology
- Two post-exposure bake stations
- 25-zone controlled precision hotplate
- Coolplate stack
- Storage for temperature sensor mask
- Automated bake optimization SW procedure
- CD uniformity optimization by profile bake
- High flexible tool controlling SW
- External media supply system
- ISO class 3 environmental control
- SEMI S2/S8 compliant
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