MaskTrack Pro

MaskTrack Pro solves next-generation lithography roadmap requirements for photomask cleaning, bake and developing. MaskTrack Pro is designed to balance the most stringent conditions of 193i 1x nm half-pitch (hp) DPT, extreme-ultraviolet lithography (EUVL) and nanomprint lithography (NIL) processing with innovative techniques to maximize mask performance.
With mask integrity playing a greater part in the success of advanced lithographic processing, MaskTrack Pro is the only platform that is specifically designed in respect to EUVL. It is extendable to allow tool clustering with third-party products for a holistic approach to storage, handling and processing of the mask in a fully-controlled and ultra-clean environment. Its modular platform guarantees maximum flexibility and customization. With its highest first pass cleaning yield MaskTrack Pro has been accepted as the platform of choice in the industry.



  • Improves time-to-market
  • Increases mask lifetime
  • Maximizes scanner uptime
  • Reduces CoO
  • Maximizes yield

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