Automated Coat/Develop Platform

Gamma

Spin - / Spray Coat and Wet Processing Platform for Volume Production and R&D

The Gamma automated photoresist and develop system is designed to meet manufacturers' needs for clean, reliable, high throughput, and cost-effective photolithography processing. With its great configuration flexibility the tool can also be tailored to perform a variety of wet processing tasks. SUSS MicroTec Gamma systems can be equipped with various sender/receiver cassette stations and modules for HMDS vapor priming, spin coating, spray coating, aqueous or solvent based developing, baking and cooling. 

more

Downloads & Contact