LabSpin6 and LabSpin8
Laboratory Coat and Develop Solution for Wafers up to 150 and 200mm
SUSS MicroTec‘s LabSpin platform represents the next generation of manual coater/developer systems that have been developed specifically for laboratory and R&D. Designed for a variety of photolithography chemicals, LabSpin systems provide uniform, precise and repeatable coating results on the wafer through its advanced cup design.
- Large process variety including spin coating and puddle developing
- Edge bead removal
- Adjustable dispense position allows for center dispense and edge coating