LabSpin6 and LabSpin8

Laboratory Coat and Develop Solution for Wafers up to 150 and 200mm

SUSS MicroTec‘s LabSpin platform represents the next generation of manual coater/developer systems that have been developed specifically for laboratory and R&D. Designed for a variety of  photolithography chemicals, LabSpin systems provide uniform, precise and repeatable coating results on the wafer through its advanced cup design.

Highlights

  • Large process variety including spin coating and puddle developing
  • Edge bead removal
  • Adjustable dispense position allows for center dispense and edge coating
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