Print Sub-50nm Resolution at Low Cost
Nanoimprint Lithography (NIL) is a versatile enabling nano manufacturing technology, that has been included on the ITRS Lithography Roadmap at the 32 and 22 nm nodes in 2003. Other applications include patterned media, sensors, high brightness LEDs, VCSELs and other optical devices. This technology has been shown to be an effective method for replication of nanometer-scale structures from a template. As a highly reliable replication process, the resolution of imprint lithography is determined by the ability to create a master template having the required dimensions. NIL has already demonstrated sub-50nm resolution at low costs and is expected to play a leading role in the commercialization of nanostructures. SUSS MicroTec equipment supports novel, cost-effective Micro/Nano-Replication technologies, such as nanoimprinting with UV and single imprinting for small and large areas.