A New Method for Large Area Nanoimprint Lithography
The Substrate Conformal Imprint Lithography (SCIL) technique combines the advantages of a soft composite working stamp for large area patterning with the advantages of a rigid glass carrier for low pattern deformation and best resolution.
SCIL uses a sequential imprinting principle. The stamp is gradually deposited from the starting point over the entire die surface on the substrate and results in a wave-like progression of the contact front. This results in minimized air inclusions even on large areas and highest uniformity. The sequential separation of stamp and substrate avoids high forces and allows for a clean and reliable disconnection without damage to the patterned structures.
The excellent performance in respect to substrate conformity and pattern fidelity over large areas makes this imprint technology a powerful tool, especially for applications like LED/VCSEL, optical elements or patterned media.
SCIL was developed by Philips Research, Eindhoven, and transferred to SUSS MicroTec in a technology license agreement. The SCIL toolkit can be field-installed on any SUSS MicroTec MA6/8 and MA/BA8 Gen3 Mask Aligner.