Overlay Metrology
Overlay is the process of aligning one layer of a process stack to the subsequent layer which is a critical parameter within the photolithographic process.
Overlay metrology uses modern pattern recognition software and algorithms to identify the overlay error between two layers prior to subsequent process steps.
SUSS MicroTec offers the DSM8 Gen2 and DSM200 Gen2 with full metrology capabilities including overlay measurement, front to back side and IR metrology.
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