The Lithography Solution for LED Manufacturing and MEMS

The MA150e is a cost efficient solution for R&D and volume production up to 6” substrates. It is widely used in the production of MEMS and telecommunication devices including applications like laser diodes, RF devices, MMICs, planar waveguides and power devices. The system combines the field-proven SUSS exposure optics and wafer-to-mask alignment equipment with a fully automated cassette-to-cassette handling system. Full field exposure and wafer transport system of the MA150e offer a throughput of up to 170 wph in first mask mode and up to 120 wph for aligned wafers.


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