MaskTrack

MaskTrack is a multi-purpose, fully-automated platform for imprint mask cleaning and critical photomask processing;  Post Exposure Bake, Develop, Strip and Clean. A unique dynamic process parameter control feature eliminates adjustment downtime in clean processes for multiple substrate use and ensures outstanding process uniformity results during bake and develop.  Since its introduction in 2005, over 30 MaskTrack systems have been shipped to industry leaders in the semiconductor industry: foundry, memory and microprocessor manufacturers.  The MaskTrack platform offers proven solutions for advanced processing at 90 – 32nm technology nodes.