Resist Coat and Develop Platform
The RCD8 coat and develop platform can be custom tailored anywhere from e.g. a basic manual spin coater to a GYRSET® enhanced coater and puddle developer tool. It can handle small pieces as well as standard wafers up to 200 mm and serves therefore ideally for daily R&D work up to small scale production.
- Optional coating and developing in the same tool reduces footprint and capital investment
- Maximized application variety for lowest cost of ownership
- Ergonomic placement of all relevant elements for ease of use
- Easy transfer of processes from the RCD8 platform to a SUSS production tool due to compatible design
- All options are field upgradable