MA/BA6 (Gen2)

Enhance the Capability of SUSS MicroTec MA/BA6 Mask Aligners using Nanoimprint Technology

The capabilities of the MA/BA6 Mask Aligner can be enhanced with various imprinting techniques for nanotechnology. The combination of reliable, versatile SUSS MicroTec Mask Aligners with NIL technologies makes an economical and innovative package for R&D allowing for an easy and fast switching between UV-standard lithography and nano imprint lithography. Variable stamp and substrate sizes allow for highest process flexibility. A tooling that enables optimized results for single imprint UV-NIL.

Please check also the MA/BA6 Mask Aligner website.

Product Highlights

 

  • Nano imprinting toolkit available for:
    • Small rigid stamp UV-NIL appplications
    • Large area soft stamp SCIL applications with high resolution and excellent repeatability
  • Printing down to sub 50nm geometries

 

Technologies

Photo Gallery

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