Spin Coaters / Spray Coaters

Meeting Your Needs with Comprehensive Coating/Developing Solutions

SUSS Spin Coaters / Spray Coaters have become synonymous with premium performance, ease of use, flexibility and enhanced coating mastery. With a complete line of compact and user-friendly spin coater / spray coater equipment from economic low-volume laboratory tools to high-end production coating up to 300mm SUSS MicroTec is the preferred choice for many microlithography process applications. SUSS Spin Coaters include the SUSS patented GYRSET system, a technique designed for solvent rich, low turbulence coating, that allows for minimal consumption of material. The SUSS proprietary developed AltaSpray Coating Technology uses a revolutionary resist deposition method that is mainly used for the fabrication of 3-D microstructures. AltaSpray enables conformal coatings across flat and steeply sloped surfaces, covering topography steps up to 600 microns and more. With the next generation ACS300 SUSS MicroTec has developed a dedicated thick resist processing solution for the advanced packaging and 3D integration industry, which requires very thick photo resist layers of up to 100 microns and more.

Fab-automated Coating Cluster

ACS200Plus

wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...
ACS300Plus

wafers: 200 and 300mm round, rectangular and square as option › read more...
ACS300 Gen2

wafers: 200 and 300mm round, rectangular and square as option. Optimized for 3D Integration › read more...

NEW!

Production Spin Coater / Spray Coater

Gamma

wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...
Gamma AltaSpray

wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...
Gamma XPress

wafers: from 2" up to 200mm, substrates: from 2"x2" up to 6"x6"› read more...