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MA/BA6 Application Results

The MA/BA6 modified for Nanoimprinting is used for a variety of applications suchs as optical gratings or micro optical components.

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  • Picture 1

    SUSS MicroTec Logo printed in Amonil MMS 4 on a SUSS MA6 Mask Aligner.

  • Picture 2 Enlarged section of SUSS logo

    U dot out of 160 nm wide holes positioned in concentric rings as used for photonics crystals.

  • Picture 3 Enlarged section of SUSS MicroTec logo

    Middle part of logo: Lines and spaces 1:2: 50 nm, 70 nm, 100nm

  • Picture 4 Enlarged section of SUSS MicroTec logo

    Section of U-Letter with holes Ø 160nm