Manual Aligner with Near Field Holography (NHF) Upgrade

Near Field Holography (NFH) is a cost-efficient method to create extremely tiny structured optical gratings (pitch between 200 and 600nm) with grating constants down to 200 nm (i.e. lines and spaces of 100 nm) NHF can be used to create ultra fine gratings for applications such as telecommunications, biosensors and various MEMS devices with grating constants up to 600 nm and requires phase shift mask made of quartz.

SUSS MicroTec has developed an NFH device with an exposure area of 100 by 100 mm. Depending on the grating constant, light with different wavelengths can be used:

• 313-nm light for grating constants between 200 and 300 mm
• 365-nm light for grating constants between 240 and 450 nm
• 435-nm light for grating constants between 400 and 600 nm

The intensity reaches 60 µW/cm² at 365 nm. Uniformity is +/- 5 percent. The entire exposure process takes only a few minutes to complete.

SUSS MicroTec offers the NFH device as a separate module in connection with SUSS MicroTec manual mask aligners (MA6, MA8, MA/BA8 Gen3). SUSS MicroTec manual mask aligners are very versatile systems, to which the NFH module can be easily attached. The SUSS MicroTec NFH device focuses on small-scale production, which offers an ideal solution for companies starting to produce advanced optical components.

SUSS MicroTec's manual NFH Aligners are offered in combination with NFH phase masks from IBSEN Photonics