Lithography Clusters
Fully Integrated Cluster for Coating, Baking, Exposing and Developing
SUSS Lithography Clusters are especially used in volume production of components for a variety of compound semiconductor, MEMS and Wafer Level Packaging applications. The cluster concept enables the streamlining of high volume production processes by automating and integrating all photolithography steps, namely coat, bake, expose and develop, in one modular system.
LithoFab200
Dedicated cluster for a large variety of photoresist and photosensitive polymer applications. For wafers and substrates from 2" to 200mm› read more...
LithoPack300
Dedicated Cluster for Wafer Level Packaging for 200 to 300mm wafers› read more...