UV-NIL (Nano Imprint Lithography)
UV-NIL is a nanoimprint method that is based on UV-curing. Depending on application requirements, UV-sensitive polymer is coated after or before the alignment. After the stamp/template has been leveled to the substrate and imprinted into the fluid UV-NIL material with with a controlled force and speed, UV curing hardens the resin. Next, the stamp/template is separated from the imprinted substrate, producing a hardened replica of the stamp on the surface of the substrate.
- AlignThe coated wafer is leveled to the template. The accuracy of the template alignment with respect to the wafer depends upon the application. For some single or first level application, there is no need to align; a rough pre-alignment can be sufficient.
- ImprintThe template is pressed into NIL material with controlled force and speed
- ExposeTo secure the stamp patterns into the imprinting resist, it is cured by UV light. Therefore, either the template or the substrate must be transparent.
- SeperateAfter the resist is cured and solidified, the stamp is separated from the substrate and the resist layer.
