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SUSS MicroTec Equipment Upgrades
Upgrades for Mask Aligners
UV-Nanoimprint Lithography for MA6/8 and MJB4
- <100nm resolution capability
- Variable stamp and substrate sizes for highest process flexibility
- Easy and fast switching between UV-lithography and nanoimprint lithography
DirectAlign for MA150/200CC
- Windows User Interface with enhanced functions (i.e. unlimited number of recipes)
- New Level of process stability with latest pattern recognition PatMax software
- Improved alignment accuracy by DirectAlign
Software Upgrade for MA300Plus
- Higher throughput
- Improved alignment accuracy by DirectAlign
- Improved uptime and reliability
MO Exposure Optics
- Improved exposure light uniformity (± 2%)widens process window and increases yield
- More light (up to 25%) leads to higher resolution & steeper sidewalls
- Customized illumination shaping enables highest process flexibiltyHigher throughput
Upgrades for Coaters
Axxis Motorized Dispense System for very small resist amounts
- Available for all coaters except Delta 6
- Dispense system for resist amounts up to 60cc
- Excellent repeatability and stability in dispense volume
- Usable for resist viscosities up to 20.000 cP
More Information needed? Contact us