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- MJB3
Manual Mask Aligner - MJB3
Features and Benefits
- For research, laboratories, small series and pilot production
- High-performance mask aligner
- Wafer and substrate size up to 3”
- Resolution far into the submicron region
Wafer size up to | 3” Ø |
|---|---|
Substrate size up to | 3” x 3” (except MJB3 Standard: 2” x 2”) |
Wafer / substrate thickness | 0 – 4.5 mm |
Mask size up to | 4” x 4” |
Exposure Modes | |
Vacuum contact (except MJB3 Standard) | |
Hard contact & soft contact | |
Exposure optics | |
Standard 280 – 450 nm (200W mercury lamp) | |
UV400 350 – 450 nm (350W mercury lamp) | |
UV300 280 – 350 nm (350W mercury lamp) | |
UV250 240 – 260 nm (500W Hg-Xe, PMMA resist) | |
UV200 210 – 230 nm (350W Cd-Xe, PMMA resist) | |
UV249 249 nm (KrF excimer laser) | |
UV193 193 nm (ArF excimer laser) | |
Uniformity | |
± 3% (2“ Ø ) (MJB3 Standard ± 5%) | |
± 5% (3“ Ø ) (MJB3 Standard ± 10%) | |
Maximum exposure area | |
3” x 3” (MJB3 Standard 3” Ø ) | |
Microscopes | |
Microscope manipulator range of movement | 50 x 50 mm |
SUSS M200 SP | |
Splitfield Microscope | |
Objective distance, adjustable | 24 – 91 mm |
Optional | 15 – 120 mm |
Illumination | Fiberoptic, 20W or 85W |
SUSS M230 SP | |
Splitfield Microscope | |
Objective distance, adjustable | 30 – 91 mm |
Illumination | Fiberoptic, 85W |
SUSS M400 | |
Normal Field Microscope | |
Illumination | Direct 15W |
