SUSS Technology Forum Nanoimprint

Join the platform where different approaches and angles of nanoimprint lithography will be presented and discussed.

MA200 Gen3: New Mask Aligner

The new tool generation incorporates an improved throughput as well as a better process administration and -definition.

DSC300 Gen2: New Projection Scanner

The new DSC300 Gen2 combines the advantages of full-field exposure and conventional projection lithography. Equipped... read more

ELP300 Gen2: New Excimer Laser Stepper

The newest generation ELP300 meets the technology driven requirements of the Advanced Packaging and 3D industry... read... read more

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SUSS MicroTec在工程領域擁有超過60年的豐富經驗,為半導體產業及相關市場之微架構製程設備的領導供應商。

我們的服務為提供最全方位的半導體設備組合及解決方案,包括後段微影、晶圓接合與前段的光罩製程設備並提供各式微光學元件。