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ABC200

Automated Wafer Bonding Cluster System

 
 
 
 
ACS200 Gen3

Combining the best of Gamma and ACS200Plus platforms

 
 
 
 
ACS200Plus

Superior Spin and Spray Coating Cluster for Volume Production

 
 
 
 
ACS300 Gen2

Production Spin Coat / Develop Cluster for Wafer Level Packaging

 
 
 
 
ASx Series

SUSS MicroTec's ASx Series is the photomask processing platform for 250nm to 90nm technology nodes.

 
 
 
 
BA200 Gen2

SUSS MicroTec mask aligners are well known for their quality, performance, and reliability. The BA200 Gen2 process module uses the same perfected wafer alignment technology as that used in thousands of SUSS MicroTec mask aligners...

 
 
 
 
BA300UHP

Ultra High Precision Bond Aligner Module

 
 
 
 
BA6 / BA8

Precision Bond Alignment from the Industry Experts

 
 
 
 
CB Wafer Bonding Modules

200mm-300mm Production Wafer Bonder for 3D Interconnect and Advanced MEMS Manufacturing

 
 
 
 
CB200M

High Performance Wafer Bonding for advanced MEMS, 3D stacking and LED applications

 
 
 
 
CBC200

200mm Production Wafer Bonder for 3D Interconnect and Advanced MEMS Manufacturing

 
 
 
 
CL200/CL8

CL200 Wafer Cleaning Module /CL8 Cleaner/Bonder

 
 
 
 
Delta 12RC

Universal Coating System for Wafers up to 300mm

 
 
 
 
Delta AltaSpray

Manual Spray Coater for High Topographies

 
 
 
 
Delta12AQ

12" Spray Develop System

 
 
 
 
Delta12L

Manual 12" Metal Lift-off System

 
 
 
 
DSC300

Projection Scanner

 
 
 
 
DSC500

Projection Scanner

 
 
 
 
DSM200 Gen2

Fully Automated Top-to-Bottom Side Alignment Verification System

 
 
 
 
DSM8 Gen2

Manual Top-To-Bottom Side Alignment Verfication System

 
 
 
 
ELP300

Excimer Laser Processing System

 
 
 
 
Gamma

Spin - / Spray Coat and Wet Processing Platform for Volume Production and R&D

 
 
 
 
HMx Series

Proven reliability and performance redesigned to meet today’s challenges

 
 
 
 
HP8

Hot Plate

 
 
 
 
LabSpin6 & LabSpin8

Laboratory Coat and Develop Solution for Wafers up to 150 and 200mm

 
 
 
 
LithoFab200

Lithography Cluster for Compound Semiconductor and MEMS Devices

 
 
 
 
LithoPack300 Gen2

Lithography Cluster for Wafer Level Packaging

 
 
 
 
MA/BA6

The Lithography Benchmark from R&D to 3D MEMS Production

 
 
 
 
MA/BA6 Gen3

150mm Semi-automated Aligner for Industrial Research and Operator-assisted Production

 
 
 
 
MA/BA8 Gen3

The Dedicated Solution for Industrial Research and Operator Assisted Alignment

 
 
 
 
MA100/150e Gen2

Dedicated Mask Aligner Solution for High Volume Production of Compound Semiconductors Devices

 
 
 
 
MA150e

The Lithography Solution for LED Manufacturing and MEMS

 
 
 
 
MA200Compact

Combining High Resolution with High Throughput and Submicron Precision

 
 
 
 
MA300 Gen2

Highly Automated Mask Aligner Platform for 300mm and 200mm Wafers

 
 
 
 
MaskTrack

MaskTrack is a multi-purpose, fully-automated platform for imprint mask cleaning and critical photomask processing: Post Exposure Bake, Develop, Strip and Clean.

 
 
 
 
MaskTrack Pro

SUSS MicroTec's, MaskTrack Pro is family of products that solves Next Generation Lithography roadmap requirements for Clean, Bake and Develop.

 
 
 
 
Micro-Optics

Refractive and diffractive Micro-Optics

 
 
 
 
MJB4

State-of-the Art R&D Solution for Small Substrates and Pieces

 
 
 
 
RCD8

Resist Coat and Develop Platform

 
 
 
 
SB200

Wafer Bonding Process Module

 
 
 
 
SB6/8e

Precision Wafer Bonding Solution

 
 
 
 
SB6L

Cost effective, High Precision Wafer Bonder

 
 
 
 
SLP300

Solid State Laser Processing System

 
 
 
 
XBC300

Process Development and Production for Advanced 3D Integration Applications

 
 
 
 
XBC300 Gen2

Permanent Bonding and Debonding / Cleaning Solution for 3D Integration Processes

 
 
 
 
XBS300

Universal Temporary Wafer Bonder for High Volume Manufacturing

 
 
 
 
 

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