SUSS MicroTec and GenISys Announce Cooperation on Mask Aligner Lithography Simulation Software

SUSS MicroTec and GenISys Announce Cooperation on Mask Aligner Lithography Simulation Software


SÜSS MicroTec AG / Key word(s): Research/Technology/

21.02.2012 / 10:01


PRESS RELEASE

SUSS MicroTec and GenISys Announce Cooperation on Mask Aligner Lithography Simulation Software

Garching, GERMANY, February 21, 2012 - SUSS MicroTec a leading supplier of equipment and process solutions for the semiconductor industry and related markets and GenISys GmbH, provider of high-performance software solutions for nano scale fabrication, today announced a cooperation agreement to combine the SUSS MicroTec mask aligner tools with the GenISys simulation software Layout LABTM.

Within the cooperation GenISys Layout LABTM has been enhanced to accurately model all available SUSS MicroTec mask aligner exposure optics. Both parties join forces to market the SUSS MicroTec mask aligner technology with the GenISys lithography simulation software Layout LABTM. The combination of lithography equipment and matching simulation software is a key success factor for cost effective process and device development for the end user.

'The sophisticated and latest SUSS exposure optics technology, MO Exposure Optics, enables the use of frontend technologies like illumination shaping and mask layout optimization on mask aligner equipment', said Frank P. Averdung, President and CEO of SUSS MicroTec AG. 'This in combination with GenISys simulation software is a key technology enabler as it allows easy modeling of large numbers of different source shapes.'

'Layout LABTM is a professional full 3D simulation platform for optical proximity lithography, which enables to optimize mask layout and exposure conditions by running a large number of simulations overnight. Besides saving direct costs, users are gaining time to market' said Nezih Unal, Vice President of GenISys.

About GenISys
Based in Munich, Germany, with offices in Tokyo, Japan, and Santa Clara, Calif., GenISys GmbH develops, markets and supports flexible, high-performance software solutions for the optimization of microstructure fabrication processes. Addressing the market for e-beam direct-write and optical lithography, GenISys combines deep technical expertise in layout data processing, process modeling, correction and optimization with high-caliber software engineering and a focus on ease of use. GenISys products give researchers, IC and MEMS manufacturers and system suppliers unparalleled efficiency, ease of use and optimal value in research, development and production of new micro-patterning technologies. For more information visit us at www.genisys-gmbh.com .

Contact:
Nezih Unal
unal@genisys-gmbh.com
+49 89 330919 760

About SUSS MicroTec
SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit http://www.suss.com.



Contact:
SUSS MicroTec AG
Franka Schielke
Schleissheimer Strasse 90
85748 Garching, Deutschland
Tel.: +49 (0)89 32007-161
Fax: +49 (0)89 32007-451
Email: franka.schielke@suss.com



End of Media Release


21.02.2012 Dissemination of a Press Release, transmitted by DGAP - a company of EquityStory AG.
The issuer is solely responsible for the content of this announcement.

DGAP's Distribution Services include Regulatory Announcements, Financial/Corporate News and Press Releases.
Media archive at www.dgap-medientreff.de and www.dgap.de



157486  21.02.2012