SÜSS MicroTec AG / Key word(s): Research/Technology/
SUSS MicroTec and GenISys Announce Cooperation on Mask Aligner Lithography Simulation Software
Garching, GERMANY, February 21, 2012 - SUSS MicroTec a leading supplier of equipment and process solutions for the semiconductor industry and related markets and GenISys GmbH, provider of high-performance software solutions for nano scale fabrication, today announced a cooperation agreement to combine the SUSS MicroTec mask aligner tools with the GenISys simulation software Layout LABTM.
Within the cooperation GenISys Layout LABTM has been enhanced to accurately model all available SUSS MicroTec mask aligner exposure optics. Both parties join forces to market the SUSS MicroTec mask aligner technology with the GenISys lithography simulation software Layout LABTM. The combination of lithography equipment and matching simulation software is a key success factor for cost effective process and device development for the end user.
'Layout LABTM is a professional full 3D simulation platform for optical proximity lithography, which enables to optimize mask layout and exposure conditions by running a large number of simulations overnight. Besides saving direct costs, users are gaining time to market' said Nezih Unal, Vice President of GenISys.
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|Company:||SÜSS MicroTec AG|
|Schleissheimer Strasse 90|
|Phone:||+49 (0)89 32007-161|
|Fax:||+49 (0)89 32007-451|
|Listed:||Regulierter Markt in Frankfurt (Prime Standard); Freiverkehr in Berlin, Düsseldorf, Hamburg, München, Stuttgart|
|End of News||DGAP-Media|