SUSS MicroTec hosts Technology Forum Nanoimprint in Grenoble

SUSS MicroTec hosts Technology Forum Nanoimprint in Grenoble

(DGAP-Media / 16.06.2014 / 11:26)

SUSS MicroTec hosts Technology Forum Nanoimprint in Grenoble

Garching, June 16, 2014 - SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, will host a technology forum for nanoimprint lithography in Grenoble on June 24, 2014. The one-day workshop covers trends and latest findings in nanoimprint lithography presented by experts from research and industry. The workshop offers the possibility to visit the clean room facilities at CIME nanotech (Centre Interuniversitaire de MicroElectronique et Nanotechnologies).

To register for the technology forum nanoimprint, please visit:

Nanoimprint lithography (NIL) is a versatile enabling nano manufacturing technology, which has been included on the ITRS Lithography Roadmap at the 32 and 22nm nodes. This technology has been shown to be an effective method for replication of nanometer-scale structures from a template. As a highly reliable replication process, the resolution of imprint lithography is determined by the ability to create a master template having the required dimensions. NIL has already demonstrated sub-50nm resolution at low costs and is expected to play a leading role in the commercialization of nanostructures. SUSS MicroTec equipment supports new, cost-effective micro/nano-Replication technologies, such as nanoimprinting with UV and single imprinting for small and large areas.

"The SUSS Technology Forum is our workshop platform with an excellent acceptance worldwide. Many customers and partners use this opportunity for both information and networking." says Frank P. Averdung, President and CEO of SUSS MicroTec. " As nanoimprinting is considered as versatile key technology for many applications we are looking forward to lively discussions."

About SUSS MicroTec
SUSS MicroTec, listed on TecDAX of Deutsche Boerse AG, is a leading supplier of equipment and process solutions for microstructuring in the semiconductor industry and related markets. In close cooperation with research institutes and industry partners SUSS MicroTec contributes to the advancement of next-generation technologies such as 3D Integration and nanoimprint lithography as well as key processes for MEMS and LED manufacturing. With a global infrastructure for applications and service SUSS MicroTec supports more than 8.000 installed systems worldwide. SUSS MicroTec is headquartered in Garching near Munich, Germany. For more information, please visit:

SUSS MicroTec AG
Franka Schielke
Schleissheimer Strasse 90
85748 Garching, Deutschland
Tel.: +49 (0)89 32007-161
Fax: +49 (0)89 32007-451

End of Media Release

Issuer: SÜSS MicroTec AG
Key word(s): Enterprise

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