Labspin Configurator

Save time by pre-configuration! Configure your specific LabSpin tool in six steps. 

A detailed offer will be shortly sent to you afterwards.

 

STEP 1. COATER / DEVELOPER Coater Developer

LabSpin comes as coater or developer. Select the functionality that you need:

  • High precision spin coating without vacuum

  • Substrate specific puddle developing supported by programmable recipes

Step 2. Model Table-top (TT) Bench-mount (BM)

Your LabSpin equipment is perfectly designed for your requirements.

Choose the model that fits your lab environment:

  • Compact housing and integrated touchscreen controller

  • Easy integration into wet bench and extra touchscreen housing

Step 3. SUBSTRATE SIZE Max. size 6“ (150 mm) wafers and 4“x4” square substrates (100 x 100 mm) Max. size 8“ (200 mm) wafers and 6“x6” square substrates (150 x 150 mm)

LabSpin processes two substrate sizes.

Specify the maximum size of your substrates:



Step 4. DISPENSE System Automatic Dispense System Pneumatic Syringe System Edge Bead Removal System No Dispense System

LabSpin dispense systems are part of SUSS MicroTec’s proven SUSS dispense technologies.

Add up to 2 dispense system and 1 system for edge bead removal:

  • Perfect for coating of multiple wafers with one resist
  • Ideal for small resist volumes (30 or 55 ml)
  • Powerful combination of full automatic dispense and precise dispense via needle
Step 5. CHUCK Vacuum chuck for 2" wafer with centering pins Vacuum chuck for 3" wafer with centering pins Vacuum chuck for 100 mm wafer with centering pins Vacuum chuck for 125 mm wafer with centering pins Vacuum chuck for 150 mm wafer with centering pins Vacuum chuck for 200 mm wafer with centering pins Vacuum chuck for 1" x 1" substrates with centering pins Vacuum chuck for 2" x 2" substrates with centering pins Vacuum chuck for 3" x 3" substrates with centering pins Vacuum chuck for 4" x 4" substrates with centering pins Vacuum chuck for 6" x 6" substrates with centering pins Vacuum chuck without centering pins 12 Vacuum chuck without centering pins 16 Vacuum chuck without centering pins 20 Special vacuum chuck Special vacuum chuck with centering pins

For durability, chemical resistance and cost-effectiveness all LabSpin chucks are made out of POM and have a simple tool free mounting system.



















Step 6. Contact

Please add your contact details so we can forward your request.

Step 2. Model Table-top (TT) Bench-mount (BM)

Your LabSpin equipment is perfectly designed for your requirements.

Choose the model that fits your lab environment:

  • Compact housing and integrated touchscreen controller

  • Easy integration into wet bench and extra touchscreen housing

Step 3. SUBSTRATE SIZE LabSpin6 LabSpin8

LabSpin processes two substrate sizes.

Specify the maximum size of your substrates:

  • Max. size 6“ (150 mm) wafers  and 4“x4” square substrates (100 mm x 100 mm)

  • Max. size 8“ (200 mm) wafers  and 6“x6” square substrates (150 mm x 150 mm)

Step 4. DISPENSE System Pressurized Dispense System DI-Water Dispense Nitrogen Drying Option No Dispense System

LabSpin dispense systems are part of SUSS MicroTec’s proven SUSS dispense technologies.

Add up to 2 dispense system and 1 system for edge bead removal:

  • Perfect for coating of multiple wafers with one resist.
  • Ideal for small resist volumes (30 or 55 ml)
  • Powerful combination of full automatic dispense and precise dispense via needle
Step 5. CHUCK Developer vaccum chuck for 2" + 200 mm wafer without centering pins Developer vaccum chuck for 100 mm + 150 mm wafer without centering pins Developer vaccum chuck for 100 mm + 200 mm wafer without centering pins

All LabSpin vacuum chucks are made of POM for superior chemical resistance and are easy to mount.

Define the characteristics of the substrate you will use on the chuck:








STEP 6. CONTACT

Please add your contact details so we can forward your request.