SUSS at Photomask Japan 2026

Photomask Japan 2026 in Yokohama is a key meeting point for specialists working on advanced mask technologies and lithography. The conference focuses on the challenges of next-generation patterning, from EUV and high-resolution mask fabrication to process control in increasingly complex semiconductor architectures.

SUSS will contribute to this environment with solutions designed for precision-critical manufacturing steps. Our portfolio supports photomask processing as well as complementary lithography and bonding applications, enabling stable, repeatable processes across a wide range of use cases. Whether for advanced nodes or specialized devices, our systems are built to meet the demands of accuracy, throughput, and integration.

Beyond technology, the event offers an opportunity to engage with experts from research and high-volume manufacturing alike. Join us in Yokohama to explore how SUSS technologies help translate evolving requirements into reliable and scalable production processes.