HMx Series

Specialized cleaning for photomasks

The optimal solution for R&D and small series of challenging substrates: the HMx Series offers high-quality substrate processing and specialized cleaning functionalities for photomask, opto-electronics, OLED, and special semiconductor back-end applications in a small, compact footprint.

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Engineered for sensitive substrates

Compact cleanroom design and outstanding flexibility: the HMx Series unites state-of-the-art develop, etch, and cleaning functions with broad substrate handling. Manual loading with automated process steps ensures proven reliability, while modern controls and advanced cleaning techniques deliver maximum safety for sensitive substrates.

Safe Chemical Management

Maximum operator and process safety: the HMx Series integrates secure chemical storage, double-contained dispense systems, and ergonomic loading areas for safe handling in every step.

Best-in-class Cleaning Yield

Exceptional first-pass yield: multiple integrated state-of-the-art cleaning techniques deliver maximum safety and protection of sensitive substrates minimizing costly rework.

Ideal Cleanroom Footprint

Fits to any environment: with a footprint of just 960 × 1120 mm for the base cabinet and 300 × 1070 mm for the media cabinet, the HMx Series offers powerful performance in a compact design.

Industry-Compliant Processing

Engineered for seamless integration, the HMx Series meets stringent industry standards. It is SEMI S2, S8, and S13 compliant, CE marked, and built for a DIN EN ISO 14644 Class 2 controlled environment. With a standard SECS/GEM 200/300 mm interface, it's ready for immediate factory automation.

Tailored to needs of the semiconductor market

Key features of the HMx Series

With innovative dispense and cleaning technologies, the HMx Series delivers consistent, defect-free results. Its modular design supports multiple process options, allowing customization for diverse applications and stringent uniformity requirements for both pilot projects or small scale production.

Lowest-Defect Developing

The A+ nozzle dispense system distributes developers evenly across the entire mask for fast and uniform surface wetting and media exchange – ensuring minimal defects and optimum quality.

ASONIC-Technology®

Acoustic streaming for superior development: By using MegaSonic energy to excite the surface, the ASONIC-Technology® increases developer media exchange for uniform utilization and improved CD uniformity.

Latest Cleaning Technologies

Dual megasonic and high-pressure Fulljet, brush cleaning, as well as in-situ SC1/SPM, UV dry cleaning, ultra-clean DI processes, backside rinsing and ESD-safe options: the HMx Series offers sophisticated cleaning technologies compliant with modern cleanroom requirements.