Coating Solutions

LabSpin Series Spin Coater & Developer

Flexible, precise, and safe: The LabSpin6 and LabSpin8 represent the latest generation of manual spin coater and developer systems for wafers up to 150 and 200 mm. Engineered specifically for laboratory and R&D environments, the LabSpin series delivers uniform, repeatable results for a wide variety of photolithographic chemicals in a compact footprint.

Talk to an expert

One system for countless possibilities

From quick prototyping to advanced process development, the LabSpin6 and LabSpin8 adapt seamlessly to your needs. Configure wafer size, chuck, coating options, and additional modules as your R&D evolves. With their compact design and intelligent technology, both systems take up little space and deliver precise, repeatable results.

Wafer Sizes from 150 mm to 200 mm

Generate small substrates for early-stage experiments or full-size wafers for advanced R&D: LabSpin6 supports round substrates up to 150 mm and square up to 100×100 mm while LabSpin8 extends that range to 200 mm round or 150×150 mm square. This flexibility lets you explore a wide variety of processes on one platform.

High Variety of Chucks

With many different chucks available, the LabSpin series adapts to a wide range of substrates, even to fragments and special shapes. This means less compromise, fewer limitations, and more reliable results across different applications.

Coater Options That Fit Your Needs

From a simple resist dispensing system to fully automatic dispensing and edge bead removal (EBR), the LabSpin series gives you exactly the functionality your process requires. Add or remove features according to your needs, ensuring you always balance cost-efficiency with process capability.

Multiple Developer Options

Configure your perfect puddle development setup with LabSpin's flexible platform. Choose from developer dispensing, DI-water rinse, and nitrogen drying options to create the exact process you need and adapt even further with an additional advanced coverplate.

Fits to All Facilities

Flexible setup for every environment: LabSpin is available as a table-top unit or seamlessly integrates as a built-in platform into a wet bench, glove box, or SUSS LabCluster. The compact footprint saves valuable cleanroom space while giving you maximum installation flexibility.

Key features of LabSpin6 and LabSpin8 Coater & Developer

Control your processes, accelerate your research

The LabSpin series is built for control at every step. With programmable recipes, adjustable spin speeds, and precise acceleration, you can fine-tune processes and reproduce them reliably for consistent, meaningful R&D results.

Spin Speed Range 50 to 8000 rpm

From as low as 50 rpm to as high as 8,000 rpm (with 200 mm chuck) – the LabSpin series covers the full range of spin requirements. Whether you need coating for sensitive layers or maximum speed for uniform films, you can set exactly the parameters you need.

Acceleration 200 rpm/s up to 3,000 rpm/s

Acceleration rates from 200 rpm/s up to 3,000 rpm/s give you full control over the coating dynamics. Achieve smooth, defect-free layers and adapt processes precisely to your material properties.

200 Custom Recipes

Save time and ensure repeatability: store up to 200 recipes with 40 steps each in one system. This allows for fast switching between processes while guaranteeing that your results remain consistent across multiple runs.