Stamp fabrication tool

NIL-SFT12 Series stamp fabrication tool

The NIL-SFT 12 series stamp fabrication tool enables fast, and precise production of high-resolution imprint stamps with excellent pattern fidelity. NIL-SFT12 series together with SUSS nanoimprint equipments deliver scalable nanoimprint manufacturing, high overlay accuracy, tight CD-control, and low cost per stamp. Built for production, it ensures high yield and seamless integration into industrial imprint workflows.

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High-quality stamp fabrication in record time

The NIL-SFT12 series enables a significant reduction in processing time. From hours to minutes through optimized UV irradiance and excellent light uniformity across the exposure area. Engineered for compatibility with a broad range of UV-curable materials, the system ensures high process stability, minimizes defect formation, and supports reproducible, high-fidelity stamp fabrication.

Next-generation tooling flatness

Significantly tightened flatness tolerances enable a new class of ultra-flat tooling. The result is reduced imprint variations, and lower defect density. Built on advanced materials, precision manufacturing, and a qualified supplier network, this tooling delivers stable, reproducible performance at wafer scale.

Reduced cost of ownership through stand-alone stamp fabrication.

A dedicated stamp fabrication solution eliminates the need to occupy high-value imprint systems during stamp production. This frees up critical tool capacity, improves overall equipment utilization, and significantly lowers cost of ownership across the nanoimprint manufacturing flow.

Stamp fabrication tool for 12 inch substrates.

Designed for large-scale imprint lithography, this system extends the proven concepts of the 200mm NIL-SFT8 series to 300 mm wafers. It combines reliability, scalability, and precision to support high-throughput, high-fidelity stamp fabrication for advanced nanoimprint applications.

Sophisticated stamps for any scale

Key features of the NIL-SFT12 series stamp fabrication tool

The advantages of ultra-flat, high-fidelity stamp fabrication are powered by carefully engineered system features. Explore the technical highlights that make precise, high-throughput, and reliable nanoimprint stamp production possible.

Superior chuck flatness

With superior chuck flatness down to 2 µm, the system ensures uniform contact and curing across the entire stamp area. This directly reduces common defects such as non-fill and trapped air, delivering higher yield and consistently reliable nanoimprint results.

High-intensity

Delivering up to 200 mW/cm² with uniformity better than ±5 %, the system enables fast and precisely controlled curing. Unlike traditional mercury lamps, it provides consistent results without hotspots or uneven exposure, improving process reliability and stamp quality.

Dual UV and thermal stamp fabrication capability

This flexible system supports both UV and thermal stamp fabrication, with upgradeable modules to adapt to evolving process requirements. It streamlines operations, reduces equipment footprint, and enables seamless transitions between process types.

Downloads

Looking for more details? Please click below to download the technical datasheet and our product presentation with in-depth product information.

Product Overview Brochure EN

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NIL-SFT12 Series Datasheet

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