Engineered for photomask accuracy
SUSS Bake & Developer systems combine high-precision temperature control with a flexible multi-mode development process to ensure ultra-low LER and tight CD uniformity. Compatible with diverse resists, they secure stable, repeatable results for every photomask writing strategy – from R&D to high-volume production.
Precise photomask writing
SUSS Photomask Bake & Developer Solutions
Precise, uniform temperature management for thermal stability across the mask surface secures CD uniformity and reliable performance for advanced nodes and high-resolution photomask writing.
Multiple process options and high compatibility with various resists: our systems combine high flexibility with precision control and deliver consistent and reliable results from standard to advanced materials.
With tightly integrated bake and develop modules, SUSS systems reduce variability, maintain ultra-low line-edge roughness and deliver turnkey performance for high-resolution masks.
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