Coating Solutions

RCD8 Semi-Automated Coater & Developer

The RCD8 platform provides precise coating and developing for wafers up to 200 mm. Designed for R&D and small-scale production, it combines stable process control with reproducible results. High-quality components ensure industrial reliability, while exchangeable substrate chucks allow the processing of different wafer materials and geometries.

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Industrial precision for flexible application

Proven production technology combined with a modular architecture for flexible process configuration.The RCD8´s compatible platform architecture enables seamless upgrades, integrations, and process transfer to high-volume systems, making it ideally suited for laboratories, research facilities, and pilot lines – all in a small, ergonomic footprint.

Production-Proven Performance

Built with identical components from SUSS high-volume production systems, the RCD8 provides the same high quality and industrial reliability in a compact, lab-ready design.

Advanced Modular Configuration

With configuration options spanning coater, developer, hotplate, vapor primer, and LabCluster integration, RCD8 adapts to your changing research and production needs. The platform accommodates a broad range of substrate shapes and literally all kinds of substrate materials with field-upgradeable options.

Seamless Scale-Up to Automation

Processes developed on the RCD8 easily transfer to SUSS’s ACS200 Gen3 fully automated platforms, ensuring consistent process parameters from development stage to full production while reducing qualification time and maintaining process integrity throughout scaling.

Key Features of RCD8 Semi-Automated Coater & Developer

Precise processes, reproducible results

With precise spin-speed, acceleration control, and a robust dispensing system supporting viscosities up to 55,000 cps, the RCD8 delivers consistent coating and developing performance. The system can also be adapted to individual production needs with optional extensions, making it suitable for a wide range of materials and applications.

Spin Speed up to 10,000 rpm

The chuck supports maximum rotational speeds up to 10,000 rpm (upgradeable to 12,000 rpm upon request), ensuring optimal film formation for a variety of coatings.

Acceleration of 7,000 rpm/sec

Acceleration rates up to 7,000 rpm/s give you full control over the coating dynamics. Achieve smooth, defect-free layers and adapt processes precisely to your material properties.

Viscosities up to 55,000 cps

Equip the RCD8 with well-proven dispensing systems for photoresist viscosities anywhere from less than 1 cps up to 55,000 cps covering every possible application window.