Coating & development for advanced wafers

Coater & Developer Solutions

Confidence in every process: SUSS Coater & Developer solutions cover all requirements in wafer processing. With uniform films, precise development, and broad substrate versatility, they boost yield, lower cost of ownership, and deliver reliable results for advanced back-end applications – from cutting-edge R&D to high-volume production.

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Versatile excellence

From thin to thick resists: SUSS systems ensure uniform layers, fast changeovers and reliable processing across all production scales.

Our products

Discover our coating and developing portfolio

ACS200 Gen3 TE

Building on the ACS200 Gen3 platform, the ACS200 Gen3 TE is an enhanced modular system designed for 100 mm to 200 mm wafers.

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Automated

ACS300 Gen2

The premium all-in-one solution for sophisticated photolithography processing of 200 and 300mm wafers.

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Automated

ACS200 Gen3

Automated coating platform for 100 - 200 mm substrates with unmatched versatility for R&D and high volume production.

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Automated

ECD8

The versatile coater or developer for wafers up to 200 mmfor both R&D and series production.

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Semi-automated

AS8

The ideal tool for R&D and low-volume fabrication of substrates up to 200 mm or 300 mm in diameter and square substrates up to 6" edge length.

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Semi-automated

LabSpin Series

Next-generation manual spin coater and developer engineered for R&D and laboratory environments.

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Manual

MCS8

The innovative labcluster for laboratories, start-ups, and small production with over 500 functionalities on the smallest cleanroom footprint.

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Manual

RCD8

Highly versatile coater and developer designed for wafers up to 200 mm for R&D and small-scale production.

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Semi-automated

HP8

The flexible R&D and small-scale coating solution for 200mm substrates with fast, uniform heating and intuitive control.

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Manual

SUSS Coater & Developer

Key Benefits

State-of-the-art technology

High-quality results: Consistent layer uniformity and precise development minimize variation and rework, directly translating into higher wafer output, improved cost efficiency, and high performance across advanced semiconductor applications.

Rapid processing

Accelerate production, keep precision: Short cycles and optimized processes deliver higher throughput, consistent results and flexible responsiveness ensuring agility to meet fast-changing market demands.

Systems for any scale

Modular design, flexible configurations: SUSS platforms handle any substrate or material, from compact lab systems to full production clusters. Seamlessly transitioning from R&D trials to high-volume production, they deliver scalable performance and lasting value.

Smart metrology for highest precision

Consistent coating, optimal yield: Integrated with SUSS ACS200/300, the TM300 module delivers automated film measurements and real-time process control for stable, high-volume results.