Advanced system for photomask cleaning and manufacturing processes

ASC9500

The ASC9500 is a fully automated photomask cleaning system from SUSS for customers in the mature photomask market. It combines 172 VUV surface preparation, final clean, hote bake and dry-flip-handling in one platform. Built on field-proven technology from our well-established cleaning systems, it delivers reliable process results down to the 38 nm technology node and offers a robust, long-life design for stable daily operation.

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Reliable photomask cleaning with lower risk and higher uptime

The ASC9500 is designed for customers who need dependable results today and a platform that supports their operations over the long term. It combines proven technology, a wider process window, and a design that simplifies installation and maintenance.

Extended Process Capability

Compared to the legacy ASC5500 platform, the ASC9500 extends process capability from the 90 nm to the 38 nm technology node with a wider, more robust process window. This allows you to serve mature photomask production with greater process margin on one platform.

Sustainable, Acid-Free Cleaning

The patented in-situ UV unit uses an acid-free process that delivers results comparable to conventional acid-based cleaning while reducing chemical consumption and environmental impact. Furthermore, this advanced method ensures a gentler cleaning process, significantly extending the overall mask lifetime.

Easier Installation and Maintenance

The platform provides enough space to accommodate all components. An improved tool infrastructure shortens installation and preventive maintenance (PM) times, so your tool can be brought online and back into production faster.

Designed for Safety

The platform is designed in accordance with SEMI S2-0821, SEMI S8-0218, IEC 60204-1, and relevant NFPA standards and uses a state-of-the-art TwinSAFE safety concept. Splash protection on all process arms supports a safe working environment.

Engineered for process reliability, safety, and serviceability

Key features of the ASC9500

Photomask production at KrF and ArF nodes demands more than particle removal. Every mask must leave the cleaner free of particles, organic residues, and residual ions, while pattern integrity, phase, and transmission must be preserved over many cleaning cycles. The ASC9500 meets these requirements with a complete sequence of well-proven process modules in one automated platform.

Surface Preparation

Wet chemistries work uniformly only on hydrophilic surfaces. The ASC9500's integrated 172 nm VUV exposure decomposes organic contamination and improves wettability, enabling reproducible cleaning across the full mask area.

Pre-Cleaning Module

Reliable removal of organic contamination and particles is the foundation of every clean. SPM is efficient, but its sulfate residues cause haze, driving the industry toward acid-free alternatives. The Pre-Cleaning Module pairs proven SPM with the patented, acid-free ISUV process, with nanospray, beam, and megasonic options to tailor the process to each mask type.

Final Cleaning Module

Final cleaning balances particle removal efficiency (PRE) against the risk of damaging fragile features like SRAFs. Since no single physical method fits every layout, the Final Cleaning Module combines beam, megasonic, and droplet spray cleaning so you can match the force to each application.

Dry-Flip Station

Effective mask cleaning covers both the patterned front side and the rear side. Every manual handling step adds a risk of contamination or damage. The integrated Dry-Flip Station turns the mask in dry condition within the automated sequence. Both sides can be processed in one run, which reduces handling risk and supports a stable, repeatable process flow.