Photomask Baking and Developing System

MaskTrack Smart BD Automated Photomask System

Industry's premium choice: MaskTrack Smart BD combines cutting-edge technology, maximum yield, and exceptional versatility delivering world-class results throughout the entire bake and develop sector.

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All-in-one solution for next-generation lithography

MaskTrack Smart BD sets new standards in cutting-edge lithography. Smart automation, modular adaptation and outstanding performance ensure optimal results, high versatility and reliable high-yield production of up to sub-32 nm wafers according to industry standards in one single platform.

Automated Precision

Experience the automated edge you need: Dry flip and low-contact handling ensure precise, gentle transfers. Multiple I/O stations streamline production, while online webcam monitoring provides real-time control.

Ultimate Performance

Accurate and consistent results: The automated algorithm precisely controls photomask surface temperatures (90°C - 130°C) to meet your exact target CDmean. A built-in feedback loop uses real-time CD data to continually improve uniformity, guaranteeing reliable, high-quality performance.

State-of-the-Art Technology

Superior quality and mask lifetime: The A+nozzle low impact dispense technology for fast and uniform surface wetting and media exchange minimizes defects and improves CD uniformity across the entire substrate.

Industry-Compliant Manufacturing

Engineered for seamless integration, our system meets stringent industry standards. It is SEMI S2, S8, and S13 compliant, CE marked, and built for a DIN EN ISO 14644 Class 2 controlled environment. With a standard SECS/GEM 200/300 mm interface, it's ready for immediate factory automation.

Sophisticated manufacturing

Key Features of MaskTrack Smart BD Photomask System

Mask storage, handling or processing: MaskTrack Smart BD ensures most complex photomask manufacturing with high product integrity at industrial scale within a fully controlled and extremely clean environment.

25-Zone Hotplate System

The intelligent hotplate system allows for precision temperature uniformity on the photomask surface during mean temperature ramp-up and at target temperature ensuring optimal post-exposure bake and high-quality results.

ASONIC-Technology®

Acoustic streaming for superior development: By using MegaSonic energy to excite the surface, the ASONIC-Technology^® increases developer media exchange for uniform utilization and improved CD uniformity.

DIN EN ISO 14.644 Standard

Production in a Class 2 Certified Environment: Special physical and wet-chemical cleaning methods effectively remove particles and contamination, providing ultra-clean conditions per DIN EN ISO 14.644. Intelligent processes ensure photomask integrity down to 1x nm half-pitch with 90nm backward compatibility.