Advanced cleaning technology for maximum yield
SUSS Photomask Cleaning Systems deliver safe, nanoscale precision that protects fragile EUV and DUV masks while boosting yield. Protecting delicate features and extending mask lifetime, our solutions combine efficiency, sustainability, and process stability for every level and scale of mask cleaning.
Nano-cleaning without compromise
Safe, thorough cleaning and high mask yields: SUSS proprietary non-contact cleaning technology lifts nanoscale particles from EUV and ArF masks without touching fragile features ensuring the integrity of advanced photomask patterns.
Unmatched contaminant removal: by combining the advantages of dry and wet cleaning processes, SUSS systems guarantee efficiency, damage-free operation, and compatibility with multiple photomask materials.
Minimize chemical usage without sacrificing performance: the eco-efficient design reduces environmental impact, extends mask lifetimes, and supports sustainable operations while meeting the strictest requirements of modern lithography.
Looking for more details? Please click below to download the technical datasheet and our product presentation with in-depth product information.
