- Automated
- Semi-Automated and Manual
- Manual
- Automated
- Semi-Automated
- Manual
- Automated Systems
- Semiautomated Systems
- Automated Systems
光掩模的完整性对高标准光刻工艺的成功起主要作用。MaskTrack Pro 光掩膜自动处理系统满足下一代光刻路线在光掩模清洗、烘烤和显影工艺方面的所有标准。它是应对 193i 1x half-pitch DPT、极紫外光刻 (EUVL) 和纳米压印光刻 (NIL)高要求的创新解决方案。以创新技术最大限度地提高光掩模性能。
MaskTrack Pro 允许用第三方的产品扩展工具集群,并提供一个全面的方法,在全控、高洁环境中存储、处理和加工光掩模。模块化设计确保其具有高度的灵活性并能高度适应客户的要求。MaskTrack Pro 在第一次运行就能提供最佳的清洁效果,被视为行业的首选平台。
缩短上市时间
延长光掩模的寿命
提高扫描仪的运行时间
降低运行成本
产量最大化
MaskTrack Pro offers a unique combination of physical and chemical cleaning technologies and methods for surface preparation and passivation that enable customers to effectively remove particles, organic and inorganic contamination while preserving mask integrity down to 1x nm hp technology node. MaskTrack Pro is backward compatible to 90 nm hp.
Physical-based Cleaning
Offering multiple physical force technologies for wet cleaning the system consists of up to three pre-clean and final-clean chambers for segregation of strip, pre-clean and final clean processes.
Chemical-based Cleaning
Sophisticated Preparation, Preservation and Restoration
Intelligent Solutions
In Line with the Industry
MaskTrack Pro is configurable as an automated sulphate-free photomask cleaning system specifically designed for cleaning of pellicallized masks for advanced technology nodes.
Physical-based Cleaning
Chemical-based Cleaning
Intelligent Solutions
In Line with the Industry
The MaskTrack Pro InSync system offers a specific solution for a holistic mask management in an EUVL environment. As an interface between the MaskTrack Pro cleaning tool and the EUV scanner, it enables automation of the EUV dual pod system. Providing an extremely high intrinsic cleanliness on environment and handling, it ensures a safe and contamination free transfer of the EUV mask the compatibility to the high sensitive vacuum environment of the EUV scanner. The innovative design allows inner pod stocking and backside particle detection with a third-party systems clustering.
Innovative Design
In Line with the Industry
The MaskTrack Pro Bake/Develop system is part of SUSS MicroTec's holistic mask product series for next-generation lithography. Designed for challenges of sub-32nm lithography the system enables most complex photomask manufacturing.
State-of-the-Art Technologies
Superior Performance
Intelligent Solutions
In Line with the Industry
TeraPure, MaskTrack Pro’s specific system for imprint templates, is proven cleaning technology and SUSS’s industry-recognized highest first-pass cleaning yield. The modular design offers customers the flexibility needed for dynamic and developing technologies, such as nanoimprint lithography (NIL).
Physical-based Cleaning
The system consists of two separate cleaning chambers for segregation of strip/ pre-clean and final clean processes, alternatively assignment of one chamber for master template cleaning and the other for replica cleaning. The wet process is conveniently monitored via online webcam.
Chemical-based Cleaning
Sophisticated Preparation, Preservation and Restoration
Intelligent Solutions
In Line with the Industry