AS8 and AS12 Coater

適用於高表面崎嶇的手動噴霧式光阻塗佈機

SUSS所開發的新型AltaSpray塗佈技術,使用一種能夠在不同的3D微結構上沈積高解析度光阻膜的創新光阻沈積方法,其可以確保在不同的結構,如90°的角落、KOH蝕刻洞、V形溝槽或透鏡上維持一致性的等角塗佈。

AS8/AS12光阻塗佈機可提供所有一般的實驗室與試產需求。它是一台適用於從幾微米到高達600微米或更高表面崎嶇的3D微結構製造上的理想設備。

SUSS AS8/AS12光阻塗佈機也能夠運用在量產應用上

亮点

適用於在嚴重的表面崎嶇差異上形成圖樣的促成科技

能夠可靠地覆蓋上方邊緣,並避免光阻堆積在溝槽中

專屬的噴灑設計,能得到最佳化的再現性與清潔度

適用於大至200mm直徑與6吋x6吋見方的基板

Up to 2 separate spray dispense systems to avoid cross contamination

Laptop with MMC controller software

All process parameters are programmable in the recipe

SUSS MicroTec Developer AS8
詳情: 塗佈

Spray coating involves spray application of the solution to the wafer through a nozzle. The path traveled by the nozzle over the wafer is optimized to ensure that the coating is applied evenly to the substrate. The solutions used in spray coating usually feature a very low viscosity, which guarantees that fine droplets form.

Spray coating ensures a uniform layer even with high topography substrates, making it the preferred technique for structures of this kind. Even square substrates can be easily coated using the spray technique.

Features and Benefits

  • Uniform coating even of highly structured surfaces

Available for:

Automated Coater and Developer

Semi-Automated Coater

Product Portfolio 2243kb
Publications
SUSS MicroTec Developer ACS200 Gen3

Optimizing Spray Coater Process Parameters

Optimizing Spray Coater Process Parameters

SUSS MicroTec Developer ACS300 Gen3

Optimizing Spray Coating Yield and Throughput

Optimizing Spray Coating Yield and Throughput

Technical Publications
Service