MA/BA Gen4 Pro Series Mask & Bond Aligner

Highly Versatile Mask and Bond Aligner for Industrial Research and Production

The MA/BA Gen4 Pro mask and bond aligner is the all-rounder of all SUSS MicroTec's semi-automated mask alignment equipment, and thus offers a wide range of application possibilities. It supports substrate sizes of up to 150 mm and 200 mm. Thanks to numerous tools and options, as well as settable process parameters, it offers maximum flexibility for research and development or production processes. A fully developed design and leading edge technology make the MA/BA Gen4 Pro series the ideal platform to develop future technology. Thus setting new standards for MEMS, advanced packaging, 3D integration and compound semiconductor applications.

Highlights

High alignment precision and resolution

Large process range

Maximum process control

SUSS MicroTec Mask Aligner MA/BA Gen4 Pro Series

The MA/BA Gen4 Pro series is easy to integrate into production environments and is highly compatible with SUSS MicroTec’ s automated mask aligners. Therefore, a process transfer from development to production is easily made. It stands out through its well designed functionality (it is an industry standard) and a high degree of functional automation. Automated pattern recognition and alignment supports a high production rate and low scrap rate.

High resolution optics and exposure systems as well as the most modern alignment processes make the MA/BA Gen4 Pro series a valuable tool when venturing into uncharted territory. It supports several imprint processes for micro and nanostructures. With only a little adaptation, it allows wafer-to-wafer alignment, easy fusion bonding as well as pre-process plasma treatments of the substrate surface. 

Top-Side Alignment (TSA)

Where lithographic processes require the alignment of structures on only one side of the device wafer (e.g. RDL, micro-bumping and similar techniques), top-side alignment is used to align the fiducials on the mask with those of the wafer. Depending on the substrate properties, this can be achieved either using stored position data for the wafer or through live image alignment, as with the DirectAlign® system invented by SUSS MicroTec.

Highlights

  • Mask aligner for the highest level of alignment precision
  • Clear and stable pattern recognition even under poor contrast conditions

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

Bottom-side Alignment (BSA)

Alignment of the structuring on the wafer back side with the structures on the front is required in processes in the field of MEMS, wafer-level packaging, 3D integration and imprint applications. Optical bottom-side alignment is normally used for this type of alignment. An integrated camera system detects the mask or stamp structures and the structures on the substrate back side, and aligns them with each other. The substrate position must be determined and stored prior to loading, since the substrate subsequently covers the mask target. This places specialized demands on the alignment system as a whole.

Highlights

• With its outstanding level of mechanical precision and stability, the SUSS mask aligner offers unmatched accuracy

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

Enhancing Alignment Precision

When stringent demands are made of overlay accuracy, the auto-alignment functionality of the standard system can be considerably extended. DirectAlign®, the SUSS MicroTec enhanced functionality for structure detection software, uses live images instead of patterns from an image memory system. The technology is based on the PatMax industry standard and achieves outstanding results. With the use of DirectAlign® on a SUSS mask aligner, an accuracy of 0.25 µm can be achieved.

The use of enhanced alignment is recommended for challenging alignment processes with structures that are easily confused or restricted fields of view.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Operator-assisted systems maintain a high degree of process control and reliability in combination with the advantages of manual wafer handling.

Available for:

Semi-Automated Mask Aligner

A mask with a certain structure is aligned with the wafer in very close proximity (thus “proximity” lithography). During exposure, the shadow cast by the mask structure is transferred to the wafer. The resulting exposure quality depends on both the precision with which the mask and wafer are spaced apart and the optical system used for exposure.
Being fast and suited to flexible implementation, this method is regarded as the most cost-effective technique for producing microstructures down to 3 µm in size. With contact exposure, resolutions in the sub-micron range can be achieved. Typical areas of use include wafer-level chip-scale packaging, flip chip packaging, bumping, MEMS, LED and power devices. The systems are deployed in high-volume production, as well as in industrial research.
The mask aligners supplied by SUSS MicroTec are based on proximity lithography.

Highlights

  • Superior resolution as a result of diffraction-reducing optics
  • Process stability through the use of microlens optical systems

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

The lower the exposure gap from mask to wafer, the higher the resolution. In soft contact mode, the wafer is brought into contact with the mask and is fixed onto the chuck with vacuum.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

In hard contact mode, the wafer is brought into direct contact with the mask, while positive nitrogen pressure is used to press the substrate against the mask. A resolution in the 1 micron range is possible in hard contact mode.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

In this mode, a vacuum is drawn between mask and substrate during exposure. This results in a high resolution of < 0.8 µm.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

The large gap optics (LGO) optics is optimized for thick resist processes with large exposure gaps and 3D lithography, offering a resolution down to 5μm. The high resolution optics (HR) is apt for contact and close proximity lithography with structures down to 3μm at 20μm exposure gap. For processes with high dose requirements on 150 mm wafers the exceptionally high intensity of the W150 HR optics facilitates high throughput.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

Diffraction-reducing exposure optics are designed to compensate for diffraction effects in both contact and proximity lithography. Instead of using a plane wave as in other proximity lithography tools, it provides an angular spectrum of planar light waves to reduce diffraction effects. The selection of a proper angular spectrum improves structure resolution in the resist.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

MO Exposure Optics® is a unique illumination optics system specifically designed for SUSS mask aligners. It is based on microlens plates instead of macroscopic lens assemblies. A simple plug and play changeover allows a quick and easy changeover between different angular settings, including the functionality of both classical SUSS HR (High Resolution) and LGO (Large-Gap Optics) illumination optics.
The telecentric illumination provided by MO Exposure Optics improves light uniformity and leads to a larger process window. Yield enhancements are produced as a result. MO Exposure Optics also decouples the exposure light from the lamp source, so small misalignments of the lamp do not affect light uniformity. A decoupled light source saves setup and maintenance time and guarantees uniform illumination conditions during the entire lifetime of the lamp.

Highlights

  • Excellent light uniformity over full exposure field
  • Stable light source
  • Customizable illumination by means of illumination filter plate exchange
  • “Deep-UV-ready” process capabilities with fused silica micro-optics
  • Special “downsizing kits” for light compression to smaller wafer sizes

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

Innovative light source
The new lamp house concept from SUSS MicroTec convinces with efficiency — UV-LED light sources reach many times the service life of conventional mercury vapor lamps. Moreover, they no longer need to warm up and cool down — the LED is only switched on during exposure. These factors significantly contribute to comparatively low energy consumption. In contrast with mercury vapor lamps, no cumbersome disposal of hazardous waste is required.
The SUSS UV-LED lamp house features the latest in technology and therefore meets the growing demand for environmental sustainability and energy efficiency.

Cost-effectiveness
The use of an LED lamp house significantly affects the operating costs of a mask aligner. The service life of an LED exceeds that of conventional lamps many times over, thereby lowering costs generated by changing lamps. Downtimes, the acquisition of new lamps, adjustments and the disposal of old material have all become a thing of the past.

Guaranteed process flexibility
Compared to conventional mercury vapor lamps, LED light sources not only work more efficiently but are also much more flexible to use. The UV-LED lamp house generally covers the same spectral region as mercury vapor lamps. The difference is that the UV-LED can switch specific wavelengths on and off. This eliminates the need to optically filter the light outside of the lamp house. Wavelengths are regulated via a programmed recipe which fulfills specific process requirements without filter change or recalibration.
When interacting with SUSS MicroTec's special MO Exposure Optics, the LED lamp house provides for maximum flexibility in process design.

Safety
Working with the LED lamp house is both safe and environmentally sound, and is a major step forward in health and occupational safety, as well as environmental protection.

Highlights

  • Lower energy consumption
  • Longer service life
  • No downtime or readjusting when changing lamps
  • No disposal of hazardous waste
  • Low maintenance thanks to reduced complexity

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

SUSS mask aligners are equipped with an enhanced WEC head system providing additional functionality. By direct and instant gap measurement during the stacking process, the parallelism between substrate and substrate, mask or stamp is reached with micrometric precision. This enables significant improvements in resolution compared to mechanical gap measurement.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

Operator-assisted systems maintain a high degree of process control and reliability in combination with the advantages of manual wafer handling.

Available for:

Semi-Automated Mask Aligner

The mask aligner optionally offers an automatic filter exchange unit for up to four filters that are selected via process recipe. This removes the risk of operator errors and thus improves yield and effective throughput.

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Auto-alignment is based on a motorized alignment stage. The COGNEX® based pattern recognition software automatically recognizes wafer target locations and controls the movement of the alignment stage. Coupled with SUSS MicroTec‘s DirectAlign®, accuracy to 0.25 μm (0.5 µm for production tools) can be achieved. Auto-alignment enables highest repeatability of process results coupled with optimized throughput and minimum operator intervention.

Available for:

Automated Mask Aligner

Semi-Automated Aligner

Assisted Alignment represents the latest development for operator assisted, semi-automated alignment. During manual alignment the COGNEX® based pattern recognition software continuously measures the achieved accuracy and reports it to the operator.

With its sub pixel resolution the system supports highest alignment precision, prevents misalignment and maximizes yield.

Available for:

Semi-Automated Mask Aligner

Simulation of lithographic processes

A simulation of lithographic processes makes the selection of optimal settings for process parameters possible without long-winded trial and error sessions. The multi-functional simulation software of lithographic processes “Lab”, which SUSS MicroTec distributes together with the supplier, GenISys, first and foremost allows the operator better process control. It offers all the required simulation functionality for an integrated design and process development, as well as verification and optimization. At the same time it covers all the process steps from illumination shaping and mask layout optimization up to photo resist processing. Additionally, modern 3D simulation functions improve the model visualizations.

The combination of MO Exposure Optics and the for SUSS optics custom-developed optical models in Lab facilitates customer-specific design optimization of the exposure filter plates, which in turn leads to an improvement in pattern fidelity.

Highlights

  • Complete simulation of the mask aligner lithographic process
  • Adjustable illumination parameters (collimation, spectral composition), custom-developed for all SUSS optics
  • Fast and flexible visualization and quantitative predictions in 1, 2 and 3D

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Manual Mask Aligner

Customer Specific Illumination Shaping and Mask Layouts

Combining optimization of mask layouts and the light source (source mask optimization), a procedure from projection lithography, makes it possible to reduce pattern inaccuracies due to illumination errors, processing artifacts and diffraction. A combined selection to match the exposure filter plates with the mask patterns (OPC = optical proximity correction) to customer specific requirements allows considerable expansion of the lithographic process functionality.

A simulation platform permits modeling of process parameters such as mask patterns and illumination parameters. This facilitates the exposure and mask patterns to be set for specific production situations with a reduced experimental effort, and reduces illumination and process errors.

Source mask optimization, together with SUSS MicroTecs customizable MO Exposure Optics® form an important contribution to improvement of process stability in mask aligner lithography.

Highlights

  • Stabilization of the light source utilizing MO Exposure Optics®
  • Optimization of the light source with exchangeable exposure filter plates
  • Mask optimization with optical proximity correction (OPC)

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Innovative light source
The new lamp house concept from SUSS MicroTec convinces with efficiency — UV-LED light sources reach many times the service life of conventional mercury vapor lamps. Moreover, they no longer need to warm up and cool down — the LED is only switched on during exposure. These factors significantly contribute to comparatively low energy consumption. In contrast with mercury vapor lamps, no cumbersome disposal of hazardous waste is required.
The SUSS UV-LED lamp house features the latest in technology and therefore meets the growing demand for environmental sustainability and energy efficiency.

Cost-effectiveness
The use of an LED lamp house significantly affects the operating costs of a mask aligner. The service life of an LED exceeds that of conventional lamps many times over, thereby lowering costs generated by changing lamps. Downtimes, the acquisition of new lamps, adjustments and the disposal of old material have all become a thing of the past.

Guaranteed process flexibility
Compared to conventional mercury vapor lamps, LED light sources not only work more efficiently but are also much more flexible to use. The UV-LED lamp house generally covers the same spectral region as mercury vapor lamps. The difference is that the UV-LED can switch specific wavelengths on and off. This eliminates the need to optically filter the light outside of the lamp house. Wavelengths are regulated via a programmed recipe which fulfills specific process requirements without filter change or recalibration.
When interacting with SUSS MicroTec's special MO Exposure Optics, the LED lamp house provides for maximum flexibility in process design.

Safety
Working with the LED lamp house is both safe and environmentally sound, and is a major step forward in health and occupational safety, as well as environmental protection.

Highlights

  • Lower energy consumption
  • Longer service life
  • No downtime or readjusting when changing lamps
  • No disposal of hazardous waste
  • Low maintenance thanks to reduced complexity

Available for:

Automated Mask Aligner

Semi-Automated Mask Aligner

Options: Imprint Lithography

Imprint lithography represents a cost-effective and highly reliable means of transferring three-dimensional nano- or micro-scale patterns onto a wide variety of substrates.

For the imprint, a stamp is brought into contact with a photosensitive material on the substrate. The photoresist fills out the three-dimensional pattern of the stamp and then solidifies under UV light. Parameters such as pattern topography, structure resolution and aspect ratio have a considerable influence on the process quality.
Thanks to its compatibility with well-established semiconductor processes, imprint lithography plays a key role in the development and production of devices in the field of LED, MEMS/NEMS, micro-optics, augmented reality and opto-electronic sensors using the renowned SMILE technology.

SUSS MicroTec solutions for imprint lithography are based on manual mask aligner platforms and support a wide range of materials and substrate with sizes up to 200 mm. Furthermore, SUSS platforms provide the capability to align and level stamps to substrates, as required by many imprint applications. Imprint equipment can also be retrofitted to SUSS mask aligners which are already in the field.

Micro- and Nano-Imprinting

For the transfer of patterns in the micro- to nanometer range, SUSS MicroTec offers SMILE (SUSS MicroTec imprint lithography equipment) technology.

There are two process variants, the use of which depends on the desired resolution.

  • For the imprinting of microstructures, the photosensitive polymer is deposited in the center of the substrate, from where it spreads radially to the outer edges, filling the stamp cavities. The exact positioning of the process gap is actively controlled via a closed feedback loop, allowing a residual layer thickness to be achieved with superior reliability.
  • To imprint nanostructures, a flexible stamp is used to contact the middle of a coated substrate, and the contact is subsequently widened radially.

The process allows very precise exposure of both micro- and nano-patterns, thereby offering a wide spectrum of potential applications and thus excellent process flexibility. For example, SMILE is used in the production of many booming applications such as augmented reality, automotive applications and much more.

Highlights

  • Precise control over resist layer thickness and uniformity
  • Structures on both wafer sides are possible
  • Stacking of lens wafers and UV bonding
  • High alignment accuracy (+/- 1 µm)
  • Edge handling or the application of buffer wafers to avoid active area contact
  • Handling of warped wafers
  • Mask aligner platforms with SMILE

Available for:

Semi-Automated Mask Aligner

Stamps for Nano- and Micro-Imprint Processes

SUSS MicroTec’s UV-SFT8 stamp fabrication tool represents a table-top solution for manufacturing high-quality composite working stamps for imprinting, accompanied by a UV-LED unit. The stamps are used for a wide variety of imprint applications in the field of LED, MEMS/NEMS, micro-optics, augmented reality and opto-electronic sensors.

The traditional method of stamp production is based on thermal curing. This method can require curing times of up to several hours. In order to accelerate the production process and increase throughput, new stamping materials have been developed which can be cured using UV light. With this new procedure, it is possible to reduce the manufacturing time of the stamps to only a few minutes.

With its high UV-light uniformity of ± 2.5 %, the system yields homogeneously cured stamps, and in turn high structure fidelity. The tool offers great flexibility due to its compatibility with a wide variety of UV curable stamp materials, which allows integration into various applications from R&D to HVM.

An optional system for puddle dispense is available for the radially symmetrical propagation of the stamp material. In addition, the dispensing system allows the application of a controllable amount, saving material and reducing waste. The tool is field upgradable from conventional thermal systems to UV-LED.

Highlights

  • Reduction in curing time
  • Usage of proven UV-LED exposure technique
  • Compatibility with a wide variety of UV curable stamp materials
  • Field upgradable from traditional thermal systems to UV-LED
  • Optional system for puddle dispense

Available for:

Semi-Automated Mask Aligner

Data Sheet

Downloads
MA/BA Gen4 Pro Series Brochure 834kb
SUSS Product Portfolio 2421kb
Imprint Lithography 2498kb
Publications

Auto-Alignment Insights – Part 2: Case Studies

Auto-Alignment Insights – Part 2: Case Studies

SUSS Smile Technology – Large Area Imprint.
A Solution for Patterning of Micro and Nano Features

SUSS Smile Technology – Large Area Imprint.
A Solution for Patterning of Micro and Nano Features

3D Topography Mask Aligner Lithography Simulation

3D Topography Mask Aligner Lithography Simulation

Auto-Alignment Insights - Part 1

Auto-Alignment Insights - Part 1

Reduction of Proximity Induced Corner Artifacts by Simulation Supported Process Optimization

Reduction of Proximity Induced Corner Artifacts by Simulation Supported Process Optimization

UV-LED Lamp House – Light Source of the Future

UV-LED Lamp House – Light Source of the Future

mr-NIL210FC_XP – A very promising resist for employment of SCIL technology in high volume industrial applications

mr-NIL210FC_XP – A very promising resist for employment of SCIL technology in high volume industrial applications

Alignment Accuracy in a MA/BA8 Gen3 Using Substrate Conformal Imprint Lithography (SCIL)

Alignment Accuracy in a MA/BA8 Gen3 Using Substrate Conformal Imprint Lithography (SCIL)

Full Wafer Double Sided Monolithic Lens Fabrication Using SUSS UV-Imprint Lithography & DELO Katiobond

11. 26. 2020

Full Wafer Double Sided Monolithic Lens Fabrication Using SUSS UV-Imprint Lithography & DELO Katiobond

Technical Publications
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