HMx Series


The HMxSquare is designed to address the needs of customers in the semiconductor industry requiring high quality substrate processing for photomask applications as well as opto-electronics, OLED, and special semiconductor back-end (MEMS) applications. It offers develop, etch and cleaning functionalites. 

The HMxSquare is manually operated and enables processing of small series or pilot production of special substrate. It combines stability and reliability of the proven performance of the original HMx series platform with today’s needs for electronic control functions, implementation of new cleaning techniques and environmental and safety requirements.


3 nm – 250 nm technology

State-of-the-art electronics and software

Variety of different chucks for damage-free handling

Safe storage of chemicals

Footprint of 960 x 1120 mm for the base cabinet and 300 x 1070 mm for the media cabinet

Industry’s highest first pass cleaning yield

Least amount of expensive cleanroom space

SUSS MicroTec Photomask Equipment HMX Square
  • Chrome and chrome oxide photomask up to 14 ”
  • Si wafers up to 300 mm
  • III/V semiconductor wafers (e.g. GaAs, InP)
  • Special substrates up to 300 mm
  • Aqueous-based develop
  • Binary and/or fan spray nozzle
  • DI water rinse
  • Spin dry
  • Sulfuric acid for surface preparation
  • SPM for organic removal
  • Brush cleaning for coarse particle removal
  • 1 MHz megasonic cleaning
  • Full jet spray
  • ESD-safe cleaning
  • Hot DIW final rinse
  • Spin dry
  • Aqueous-based etch
  • Fan spray or puddle
  • DI water rinse
  • Spin dry
  • SEMI S2, S8, S13 compliant
  • CE marked
  • Conform to European harmonized standards and machine directive 2006/42/EC, EMC directive 2004/108/EC and low voltage directive 2006/95/EC
  • Ready for factory automation via SECS/GEM 200 mm standard interface
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